In the 2nm node semiconductor process, GAA three-dimensional structures face challenges such as new materials and require super high resolution monitoring to ensure process yields. The team develops this 2 nm node front-end metrology tool based on X-ray technology. The XRCD metrology tool measures multilayer GAA structures and monitors critical dimensions with atomic-level resolution, reducing measurement time by 90%. The target market includes foundry and memory below N2 process node. The market is expected to be USD 130 million in 2025, with an annual growth rate of 36.8%.